China's domestic extreme ultraviolet (EUV) lithography development is far from a distant dream. The newest system, now undergoing testing at Huawei's Dongguan facility, leverages laser-induced dischar
ge plasma (LDP) technology, representing a potentially disruptive approach to EUV light generation. The system is scheduled for trial production in Q3 2025, with mass manufacturing targeted for 2026, ...
Автор: AleksandarK
Источник: https://www.techpowerup.com/333801/china-develops-domestic-euv-tool-asml-monopoly-in-trouble