Forge Nano, Inc., a technology company pioneering domestic battery and semiconductor innovations, today announced a breakthrough that fundamentally redefines the economics and architecture of advanced
semiconductor manufacturing. The company has demonstrated high-speed, defect-free atomic layer deposition (ALD) coatings in semiconductor features at a 1000:1 aspect ratio. Conformality is maintained ...
Автор: TheLostSwede
Источник: https://www.techpowerup.com/346003/forge-nano-transforms-advanced-semiconductor-chip-manufacturing-with-high-speed-1000-1-aspect-ratio-atomic-layer-deposition-coatings