ASML Boosts EUV Power to 1,000W for Better Yields and Lower Chip Costs

ASML says it has boosted the light source power in its EUV lithography systems to 1,000 watts, up from roughly 600 W today. According to a Reuters report, the company claims the increase could enable

up to 50% more chip output by the end of the decade. More source power translates directly into higher throughput. ASML says customers could process around 330 wafers per hour by 2030, compared to abo ...